Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process

A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetram...

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Veröffentlicht in:Crystal growth & design 2004-01, Vol.4 (1), p.53-56
Hauptverfasser: Zhu, Shizheng, Xing, Chunhui, Xu, Wei, Jin, Guifang, Li, Zhanting
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Sprache:eng
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Zusammenfassung:A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule.
ISSN:1528-7483
1528-7505
DOI:10.1021/cg0300275