Halogen Bonding and Hydrogen Bonding Coexist in Driving Self-Assembly Process
A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetram...
Gespeichert in:
Veröffentlicht in: | Crystal growth & design 2004-01, Vol.4 (1), p.53-56 |
---|---|
Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A new class supramolecular architecture of 1,1,3,3-tetra-oxo-2-bromo-4,4,5,5,6,6-hexafluoro-1,3-dithiacyclohexane 1 and 2-methylpyrazine has been assembled through both hydrogen bonding and halogen bonding. However, stronger or weaker bases or electron donors such as pyrazine and N,N,N ‘ ,N ‘-tetramethylenediamine (TMEDA) failed to give the corresponding supramolecule. |
---|---|
ISSN: | 1528-7483 1528-7505 |
DOI: | 10.1021/cg0300275 |