Comparison of CH, C 3 , CHF, and CF 2 Surface Reactivities during Plasma-Enhanced Chemical Vapor Deposition of Fluorocarbon Films

Comparison of CH, C 3 , CHF, and CF 2 Surface Reactivities during Plasma-Enhanced Chemical Vapor Deposition of Fluorocarbon Films

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Veröffentlicht in:ACS applied materials & interfaces 2009-04, Vol.1 (4), p.934-943
Hauptverfasser: Liu, Dongping, Cuddy, Michael F., Fisher, Ellen R.
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container_title ACS applied materials & interfaces
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creator Liu, Dongping
Cuddy, Michael F.
Fisher, Ellen R.
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doi_str_mv 10.1021/am900034x
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title Comparison of CH, C 3 , CHF, and CF 2 Surface Reactivities during Plasma-Enhanced Chemical Vapor Deposition of Fluorocarbon Films
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