Photoinduced Upgrading of Lactic Acid-Based Solvents to Block Copolymer Surfactants

We report a new strategy toward the development of block copolymer surfactants from chemicals of the lactic acid family. A particularly unique aspect of this work is the use of green solvents as biobased platform chemicals to generate well-defined and nanostructure-forming materials. Herein, efficie...

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Veröffentlicht in:ACS sustainable chemistry & engineering 2020-01, Vol.8 (2), p.1276-1284
Hauptverfasser: Bensabeh, Nabil, Moreno, Adrian, Roig, Adrià, Rahimzadeh, Mehrnoush, Rahimi, Khosrow, Ronda, Juan Carlos, Cádiz, Virginia, Galià, Marina, Percec, Virgil, Rodriguez-Emmenegger, Cesar, Lligadas, Gerard
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Sprache:eng
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Zusammenfassung:We report a new strategy toward the development of block copolymer surfactants from chemicals of the lactic acid family. A particularly unique aspect of this work is the use of green solvents as biobased platform chemicals to generate well-defined and nanostructure-forming materials. Herein, efficient functionalization of ethyl lactate (EL) and N,N-dimethyl lactamide (DML) solvents with acrylate groups generated monomers that could be polymerized by the photoinduced copper-catalyzed living radical polymerization process to yield polymeric materials with different water solubilities. These lactic acid-derived monomers were used as a major component in well-defined diblock copolymers composed of poly­(EL acrylate) and poly­(DML acrylate) segments as hydrophobic and hydrophilic building blocks, respectively. The resulting amphiphilic copolymers could self-assemble in aqueous solution to form nanoparticles with different morphologies (e.g., large-compound micelles and vesicles). Subsequently, the formed amphiphilic polymers were employed as efficient stabilizers in the emulsion polymerization of methyl methacrylate and styrene, offering a facile method for the synthesis of well-defined and stable polymer latexes in the range of 100–200 nm, demonstrating the practical significance of these biobased polymers in nanomaterial synthesis.
ISSN:2168-0485
2168-0485
DOI:10.1021/acssuschemeng.9b06599