Promoting a Weak Coupling of Monolayer MoSe 2 Grown on (100)-Faceted Au Foil

As a two-dimensional semiconductor with many physical properties, including, notably, layer-controlled electronic bandgap and coupled spin-valley degree of freedom, monolayer MoSe is a strong candidate material for next-generation opto- and valley-electronic devices. However, due to substrate effect...

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Veröffentlicht in:ACS nano 2021-03, Vol.15 (3), p.4481-4489
Hauptverfasser: Wu, Qilong, Fu, Xiaoshuai, Yang, Ke, Wu, Hongyu, Liu, Li, Zhang, Li, Tian, Yuan, Yin, Long-Jing, Huang, Wei-Qing, Zhang, Wen, Wong, Ping Kwan Johnny, Zhang, Lijie, Wee, Andrew T S, Qin, Zhihui
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Sprache:eng
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Zusammenfassung:As a two-dimensional semiconductor with many physical properties, including, notably, layer-controlled electronic bandgap and coupled spin-valley degree of freedom, monolayer MoSe is a strong candidate material for next-generation opto- and valley-electronic devices. However, due to substrate effects such as lattice mismatch and dielectric screening, preserving the monolayer's intrinsic properties remains challenging. This issue is generally significant for metallic substrates whose active surfaces are commonly utilized to achieve direct chemical or physical vapor growth of the monolayer films. Here, we demonstrate high-temperature-annealed Au foil with well-defined (100) facets as a weakly interacting substrate for atmospheric pressure chemical vapor deposition of highly crystalline monolayer MoSe . Low-temperature scanning tunneling microscopy/spectroscopy measurements reveal a honeycomb structure of MoSe with a quasi-particle bandgap of 1.96 eV, a value comparable with other weakly interacting systems such as MoSe /graphite. Density functional theory calculations indicate that the Au(100) surface exhibits the preferred energetics to electronically decouple from MoSe , compared with the (110) and (111) crystal planes. This weak coupling is critical for the easy transfer of monolayers to another host substrate. Our study demonstrates a practical means to produce high-quality monolayers of transition-metal dichalcogenides, viable for both fundamental and application studies.
ISSN:1936-0851
1936-086X
DOI:10.1021/acsnano.0c08513