Self-Organized Wrinkling in Thin Polymer Films under Solvent–Nonsolvent Solutions: Patterning Strategy for Microfluidic Applications

Self-organized wrinkling instabilities in thin polymer films have instigated a field of versatile surface patterning and have spurred several research efforts in developing micro- and nanopatterned templates for a wide range of applications. Here, we report for the first time a distinct class of wri...

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Veröffentlicht in:ACS applied polymer materials 2021-12, Vol.3 (12), p.6198-6206
Hauptverfasser: Singh, Naval, Verma, Ankur, Sachan, Priyanka, Sharma, Ashutosh, Kulkarni, Manish M
Format: Artikel
Sprache:eng
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Zusammenfassung:Self-organized wrinkling instabilities in thin polymer films have instigated a field of versatile surface patterning and have spurred several research efforts in developing micro- and nanopatterned templates for a wide range of applications. Here, we report for the first time a distinct class of wrinkles in a thin polymer (polystyrene, PS) film coated on a substrate under a mixture of organic solvent and aqueous nonsolvent. The solvent (dimethyl formamide, DMF) softens and swells the polymer and paves the way for wetting of the hydrophilic substrate (≥46 mJ/m2) by the solvent–nonsolvent (S-NS) mixture, leading to wrinkle formation. It is investigated that selective delamination-induced wrinkling is a generic phenomenon and takes place in various polymers as well as different combinations of solvent–nonsolvent mixtures. The surface energy of the substrate and the composition of the solvent–nonsolvent mixture play a critical role as wrinkling is not observed on substrates with lower surface energy (
ISSN:2637-6105
2637-6105
DOI:10.1021/acsapm.1c01044