Atomic Layer Deposition of Silicon Nitride from Bis( tert -butylamino)silane and N 2 Plasma
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| Veröffentlicht in: | ACS applied materials & interfaces 2015-09, Vol.7 (35), p.19857-19862 |
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| Sprache: | eng |
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| container_end_page | 19862 |
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| container_issue | 35 |
| container_start_page | 19857 |
| container_title | ACS applied materials & interfaces |
| container_volume | 7 |
| creator | Knoops, Harm C. M. Braeken, Eline M. J. de Peuter, Koen Potts, Stephen E. Haukka, Suvi Pore, Viljami Kessels, Wilhelmus M. M. |
| description | |
| doi_str_mv | 10.1021/acsami.5b06833 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 1944-8244 |
| ispartof | ACS applied materials & interfaces, 2015-09, Vol.7 (35), p.19857-19862 |
| issn | 1944-8244 1944-8252 |
| language | eng |
| recordid | cdi_crossref_primary_10_1021_acsami_5b06833 |
| source | ACS Publications |
| title | Atomic Layer Deposition of Silicon Nitride from Bis( tert -butylamino)silane and N 2 Plasma |
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