THz Thin Film Varactor Based on Integrated Ferroelectric HfZrO 2
In this paper, we present a broadband microwave characterization of ferroelectric hafnium zirconium oxide (Hf Zr O ) metal-ferroelectric-metal (MFM) thin film varactor from 1 kHz up to 0.11 THz. The varactor is integrated into the back-end-of-line (BEoL) of 180 nm CMOS technology as a shunting capac...
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Veröffentlicht in: | ACS applied electronic materials 2023-01, Vol.5 (1), p.189-195 |
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Sprache: | eng |
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Zusammenfassung: | In this paper, we present a broadband microwave characterization of ferroelectric hafnium zirconium oxide (Hf
Zr
O
) metal-ferroelectric-metal (MFM) thin film varactor from 1 kHz up to 0.11 THz. The varactor is integrated into the back-end-of-line (BEoL) of 180 nm CMOS technology as a shunting capacitor for the coplanar waveguide (CPW) transmission line. At low frequencies, the varactor shows a slight imprint behavior, with a maximum tunability of 15% after the wake-up. In the radio- and mmWave frequency range, the varactor's maximum tunability decreases slightly from 13% at 30 MHz to 10% at 110 GHz. Ferroelectric varactors were known for their frequency-independent, linear tunability as well as low loss. However, this potential was never fully realized due to limitations in integration. Here, we show that ferroelectric HfO
thin films with good back-end-of-line compatibility support very large scale integration. This opens up a broad range of possible applications in the mmWave and THz frequency range such as 6G communications, imaging radar, or THz imaging. |
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ISSN: | 2637-6113 2637-6113 |
DOI: | 10.1021/acsaelm.2c01273 |