Radio-Frequency Characteristics of Ge-Doped Vanadium Dioxide Thin Films with Increased Transition Temperature

This work investigates and reports on the radio-frequency (rf) behavior in the frequency range of 5–35 GHz of germanium-doped vanadium dioxide (Ge-doped VO2) thin films deposited on silicon substrates via sputtering and pulsed laser deposition (PLD) with estimated Ge concentrations of 5 and 5.5%. Both films exhibit critical transition temperatures (T c) of 76.2 and 72 °C, respectively, which are higher compared to that of the undoped VO2 which undergoes reversible insulator-to-metal phase transition at 68 °C. Both types of Ge-doped films show low hysteresis (