Sequential Infiltration of Self-Assembled Block Copolymers: A Study by Atomic Force Microscopy

Sequential infiltration synthesis (SIS), when combined with novel polymeric materials capable of self-assembly, such as block copolymers (BCPs), has been shown to effectively improve the pattern transfer of nanoscale templates. Herein, we present a study of the SIS process aimed at elucidating some critical aspects such as the evolution of the BCP morphology and mechanical properties after infiltration. Atomic force microscopy nanomechanical mapping was able to measure a consistent stiffness change within the SIS-infiltrated poly­(methyl methacrylate) (PMMA) blocks. Interestingly, the increase in Young’s modulus of the infiltrated blocks is small compared to the final stiffening of the same infiltrated features after a treatment with oxygen plasma.