Polymorphism in Type-II Dirac Semimetal WSi 2 under Pressure: Structural, Mechanical, and Electronic Insights
The type-II Dirac candidate semimetal WSi is a promising candidate for electronic devices, quantum computing, and topological materials research, owing its distinct electronic structure and superior mechanical properties. Here, we synthesized high-quality WSi materials and systematically investigate...
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Veröffentlicht in: | Inorganic chemistry 2024-11, Vol.63 (46), p.22227-22238 |
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Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
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Zusammenfassung: | The type-II Dirac candidate semimetal WSi
is a promising candidate for electronic devices, quantum computing, and topological materials research, owing its distinct electronic structure and superior mechanical properties. Here, we synthesized high-quality WSi
materials and systematically investigated their compressive behavior, and structural and electronic properties under high pressure using in-situ high pressure experiments, complemented by first-principles calculations. The results confirms that WSi
has the properties of a type-II Dirac semimetal. Our results demonstrate that WSi
maintains structural stability under high pressure but undergoes an electronic phase transition from a semimetal to a metal around 40 GPa. Additionally, the mechanical hardness softens discontinuously at this pressure. The structural stability of WSi
under high pressure is attributed to the strong hybridization of Si-3
and W-5
electrons, the rigid crystal lattice, and the adaptable electronic structure. The pressure-induced electronic phase transition and softening are primarily governed by the energy band reconstruction and W-5
orbitals. This study provides valuable insights into the high-pressure behavior of type-II Dirac semimetal, highlighting their potential for advanced applications in electronic devices and topological quantum computing under extreme conditions by elucidating their structural stability and electronic phase transition mechanisms. |
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ISSN: | 0020-1669 1520-510X |
DOI: | 10.1021/acs.inorgchem.4c03850 |