Modeling of Liquid-Phase Oxidation of Para-xylene at a Low Oxygen Partial Pressure
The effect of a low oxygen partial pressure on the oxidation of the liquid phase of para-xylene (PX) was investigated in a continuous stirred tank reactor (CSTR). The kinetic model of the PX oxidation process was established with factors such as the reaction temperature, pressure, and catalyst. The...
Gespeichert in:
Veröffentlicht in: | Industrial & engineering chemistry research 2023-10, Vol.62 (40), p.16302-16308 |
---|---|
Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The effect of a low oxygen partial pressure on the oxidation of the liquid phase of para-xylene (PX) was investigated in a continuous stirred tank reactor (CSTR). The kinetic model of the PX oxidation process was established with factors such as the reaction temperature, pressure, and catalyst. The reliability of this CSTR model of the reactor was validated through continuous PX oxidation experiments. The results showed that the reactor model fitted the experimental data well. This reactor model will provide not only insights into the industrial PX oxidation process but also support for the design and development of industrial reactors. |
---|---|
ISSN: | 0888-5885 1520-5045 |
DOI: | 10.1021/acs.iecr.3c02552 |