A Tough and Self-Powered Hydrogel for Artificial Skin

Hydrogels, because of their water-rich nature and soft mechanical characteristics that resemble those of skin tissues, are promising materials for artificial skin. Existing piezoresistive hydrogels combine unique tissue-like and sensory properties, but these materials are often plagued by problems s...

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Veröffentlicht in:Chemistry of materials 2019-12, Vol.31 (23), p.9850-9860
Hauptverfasser: Fu, Rumin, Tu, Lingjie, Zhou, Yahong, Fan, Lei, Zhang, Fengmiao, Wang, Zhengao, Xing, Jun, Chen, Dafu, Deng, Chunlin, Tan, Guoxin, Yu, Peng, Zhou, Lei, Ning, Chengyun
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Sprache:eng
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Zusammenfassung:Hydrogels, because of their water-rich nature and soft mechanical characteristics that resemble those of skin tissues, are promising materials for artificial skin. Existing piezoresistive hydrogels combine unique tissue-like and sensory properties, but these materials are often plagued by problems such as poor mechanical properties and the requirement of an external power supply or batteries. Here, a tough and self-powered hydrogel based on a tough polyacrylonitrile hydrogel incorporating ferroelectric poly­(vinylidene fluoride) (PAN-PVDF) is reported. The dipolar interactions between the PVDF and PAN chains cause an increase in the best electroactive β-phase PVDF percentage in the composites from 0 to 91.3%; thus, a maximum piezoelectric coefficient d 33, 30 pC N–1, was achieved for the hydrogels. Skin-like Young’s modulus values (1.33–4.24 MPa), stretchability (90–175%), and high toughness (1.23 MJ/m2) were achieved simultaneously for the hydrogels. This tough gel is capable of generating an electrical signal output (≈30 mV and ≈2.8 μA) with a rapid response (≈31 ms) due to the stress-induced poling effect. Moreover, the gel can also precisely detect physiological signals (e.g., gesture, pulse, and words). This study provides a simple and efficient method for artificial skin with high toughness, self-power generation capability, fast response, low cost, and tissue-like properties.
ISSN:0897-4756
1520-5002
DOI:10.1021/acs.chemmater.9b04041