Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2‑Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2‑Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine

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Veröffentlicht in:Chemistry of materials 2015-07, Vol.27 (14), p.4918-4921
Hauptverfasser: Klesko, Joseph P, Thrush, Christopher M, Winter, Charles H
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container_title Chemistry of materials
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Winter, Charles H
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doi_str_mv 10.1021/acs.chemmater.5b01707
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title Thermal Atomic Layer Deposition of Titanium Films Using Titanium Tetrachloride and 2‑Methyl-1,4-bis(trimethylsilyl)-2,5-cyclohexadiene or 1,4-Bis(trimethylsilyl)-1,4-dihydropyrazine
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