Structure and electrochromic properties of WO3 thin films by direct current, pulsed direct current, and radio frequency magnetron sputtering from metallic and ceramic targets

•Electrochromic properties of sputtered films from WO3 and W targets were investigated.•Films were produced using different power sources of DC, pulsed DC, RF generators.•Change in transmittance was observed regardless of sputtering power and target type.•Films under DC power using W target exhibited optimal electrochromic properties. The structure, morphology, and electrochromic properties of sputtered-WO3 thin films from ceramic and metallic targets were investigated. The films were produced using different types of power sources, namely, direct current (DC), pulsed DC, and radio frequency (RF) generators. Highly transparent as-deposited WO3 thin films grown at room temperature using each target changed to dark blue upon introduction of an electric field in electrolyte regardless of types of sputtering power. WO3 films obtained by sputtering the ceramic target using a pulsed DC power exhibited a large transmittance difference of 97.5% and high coloration efficiency of 55.2 cm2/C compared to the films using DC and RF powers, these films had higher response speeds and stable transmittance modulation after long-term cycle tests. WO3 thin films produced by sputtering a metallic tungsten target showed enhanced electrochromic performance when grown under DC power and a coloration efficiency of 69.1 cm2/C due to their porous microstructure. This article presents methods for the fabrication of low-cost and large-scale oxide electronic devices for various applications, such as electrochromic displays, that can be applied for mass production.