Transparent and highly conductive La-doped strontium stannate thin film growth by PI-MOCVD method on LaAlO3 and MgO substrates of (100), (110), (111) orientations

•Novel epitaxial, textured and polycrystalline La-doped SrSnO3 thin film deposition by MOCVD.•Growth mechanisms on (100), (110), (111) -orientated LaAlO3 and MgO substrates.•Electron mobility of 73 cm2V−1s−1 was obtained in narrow compositional window. Wide band gap (4.6 eV) lanthanum doped SrSnO3 semiconductors of high electron mobility have potential applications in transparent oxide semiconductor technologies. However, there is a lack of data on the electrical properties of La:SrSnO3 both in single crystals and in thin films with an orientation other than (001). We show that after applying a modified metalorganic chemical vapor deposition method it is possible to deposit relaxed thick (001), (110) and (111) oriented La:SrSnO3 films on LaAlO3 and MgO substrates. Thin films on LaAlO3 substrates exhibit comparatively high charge carrier mobility values: µ100=71 cm2V−1s−1, µ110=72 cm2V−1s−1 and µ111=67 cm2V−1s−1. In this article, using the results of X-ray diffraction and crystallite orientation distribution modeling, as well as scanning and transmission electron microscopy data, the link between the obtained charge carrier mobility (µ100 ≈ µ110 > µ111) and film's microstructure and morphology is discussed.