Precise control and adjustment of uniformity for optical coatings on 2D and 3D components

The uniformity of a PVD coating process is investigated and adjusted in this work. With the help of a digital twin derived from physical modelling of the plasma and gas flow dynamics in the reactor, it is possible to precisely predict and define the gradients on the individual surface geometries. By using calculated masks, the distribution can be actively influenced. In addition, the predicted distribution during coating can be verified using in-situ characterization techniques using a hyperspectral camera. In this method, the sample is measured using lens optics with a line focus. This measuring system has been implemented in industrial coating systems. The tools presented here expand the portfolio for PVD coating processes. It enables precise layer thickness distributions of uniform and gradient coatings on 2D and 3D substrates. •Predict deposition rates with digital twin•Adjustment of distribution on the 2d and 3d substrates•In-situ hyperspectral measurement for uniformity control