Optimization of deposition parameters and performance analysis of Nb-Zr-N composite films

Nb-Zr-N composite films were successfully deposited on Si (100) wafers and 316 L substrates using DC magnetron sputtering, and their deposition parameters were designed using orthogonal experiment, and then were optimized based on their mechanical properties. The microstructure and tribological properties of some films were analyzed and investigated, respectively. The results show that the maximum hardness and elastic modulus of the Nb-Zr-N films are 18.2 GPa and 208 GPa, respectively. The crystal structure of the Nb-Zr-N films is a face-centered cubic solid solution mixed structure when the Zr concentration ranges from 3 at.% to 14 at.%. As the Zr/Nb stoichiometric ratio increases, the average grain size and lattice constant increase. The high yield strength of Nb-Zr-N films is closely related to solid solution strengthening and grain refining. Moreover, Nb-Zr-N film deposited at the combination parameter (A1B4C4) has a Zr/Nb atomic ratio of 0.07, and has relatively excellent tribological properties in air. •Deposition parameters were optimized by orthogonal experiments design.•Plastic parameters of Nb-Zr-N films were obtained by FEM and particle swarm optimization.•Nb-Zr-N films were strengthened with solid solution strengthening and grain refinement.•The Nb-Zr-N film with a Zr/Nb atomic ratio of 0.07 has excellent tribological properties.