Photovoltaic effect in Si/SiO2 superlattice microdisk array solar cell structure

Silicon/silicon dioxide (Si/SiO2) superlattice microdisk (SLMD) array solar cell structures were fabricated by a photolithography process. An open-circuit voltage of 661 mV was obtained from a Si/SiO2 SLMD array solar cell using a superlattice composed of 5.6-nm-thick Si layers and 2.5-nm-thick SiO2...

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Veröffentlicht in:Superlattices and microstructures 2020-09, Vol.145, p.106640, Article 106640
Hauptverfasser: Yamada, Shigeru, Shirayanagi, Yusuke, Narihara, Teruhiko, Kumada, Masatoshi, Porponth, Sichanugrist, Ichikawa, Yukimi, Miyajima, Shinsuke, Konagai, Makoto
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Sprache:eng
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Zusammenfassung:Silicon/silicon dioxide (Si/SiO2) superlattice microdisk (SLMD) array solar cell structures were fabricated by a photolithography process. An open-circuit voltage of 661 mV was obtained from a Si/SiO2 SLMD array solar cell using a superlattice composed of 5.6-nm-thick Si layers and 2.5-nm-thick SiO2 layers. This open-circuit voltage is significantly higher than that of polycrystalline silicon microdisk solar cells. We also investigated the quantum efficiency and the temperature dependence of the open-circuit voltage. Detailed analysis suggests that the bandgap of the Si/SiO2 superlattice is approximately 1.4 eV, which is larger than that of c-Si. •Photovoltaic effect in Si/SiO2 superlattice solar cells.•Fabrication technique of sdsuperlattice microdisk array solar cells.•Confirmation of quantum size effect from electrical properties.
ISSN:0749-6036
1096-3677
DOI:10.1016/j.spmi.2020.106640