Photovoltaic effect in Si/SiO2 superlattice microdisk array solar cell structure
Silicon/silicon dioxide (Si/SiO2) superlattice microdisk (SLMD) array solar cell structures were fabricated by a photolithography process. An open-circuit voltage of 661 mV was obtained from a Si/SiO2 SLMD array solar cell using a superlattice composed of 5.6-nm-thick Si layers and 2.5-nm-thick SiO2...
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Veröffentlicht in: | Superlattices and microstructures 2020-09, Vol.145, p.106640, Article 106640 |
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Hauptverfasser: | , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Silicon/silicon dioxide (Si/SiO2) superlattice microdisk (SLMD) array solar cell structures were fabricated by a photolithography process. An open-circuit voltage of 661 mV was obtained from a Si/SiO2 SLMD array solar cell using a superlattice composed of 5.6-nm-thick Si layers and 2.5-nm-thick SiO2 layers. This open-circuit voltage is significantly higher than that of polycrystalline silicon microdisk solar cells. We also investigated the quantum efficiency and the temperature dependence of the open-circuit voltage. Detailed analysis suggests that the bandgap of the Si/SiO2 superlattice is approximately 1.4 eV, which is larger than that of c-Si.
•Photovoltaic effect in Si/SiO2 superlattice solar cells.•Fabrication technique of sdsuperlattice microdisk array solar cells.•Confirmation of quantum size effect from electrical properties. |
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ISSN: | 0749-6036 1096-3677 |
DOI: | 10.1016/j.spmi.2020.106640 |