A microporous water stable MOF for consistent and selective C2H2/C2H4 separation
[Display omitted] •A microporous (∼4.5 × 4.5 Å2) new water-stable 3D MOF is synthesized.•Prolonged moisture stability (97% RH for 15 days).•Excellent C2H2/C2H4 uptake ratio and IAST separation selectivity.•Complete separation with column breakthrough experiment.•Highly regenerable with consistent lo...
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Veröffentlicht in: | Separation and purification technology 2023-09, Vol.320, p.124208, Article 124208 |
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Sprache: | eng |
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•A microporous (∼4.5 × 4.5 Å2) new water-stable 3D MOF is synthesized.•Prolonged moisture stability (97% RH for 15 days).•Excellent C2H2/C2H4 uptake ratio and IAST separation selectivity.•Complete separation with column breakthrough experiment.•Highly regenerable with consistent loading over multiple breakthrough cycles.
Polymer-grade ethylene production requires the removal of trace acetylene, which possesses an intractable industrial separation task. Metal-organic frameworks (MOFs) having stability in water/moisture-containing environments are the promising alternative physisorbent material for the purification of C2H4 from C2H2-containing mixtures. In this study, a three-dimensional MOF (IITKGP-30) with narrow pore channels (∼4.5 × 4.5 Å2) is developed for C2H2/C2H4 separation exhibiting excellent IAST separation selectivity of 3.3 (1:99) and 6.2 (50:50) at 295 K under 1 bar. Theoretical investigation revealed preferentially binding of acetylene molecules to the metal site in an end-on fashion equivalent to 4.76 kJ mol−1 more binding energy than ethylene. Dynamic breakthrough experiments with 1:99 (v/v) C2H2/C2H4 mixtures at 298 K revealed a complete separation of the binary mixture with excellent breakthrough selectivity of 2.4 and the ethylene productivity of 10.4 mL g−1. It is highly stable under 97% RH as long as 15 days and in the presence of water, can maintain a C2H2 uptake and retention time minimum up to three breakthrough cycles with ease of regenerability, thus showing its great promise for practical deployment. |
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ISSN: | 1383-5866 1873-3794 |
DOI: | 10.1016/j.seppur.2023.124208 |