Excitation wavelength dependent nonlinear absorption mechanisms and optical limiting properties of Bi12SiO20 single crystal

Nonlinear absorption mechanisms (NA), excitation wavelength dependence, and defect states of Bi12SiO20 (BSO) single crystal were investigated. The band gap and Urbach energies were found to be 2.51 and 0.4 eV from the absorption spectra. To evaluate the effect of excitation energy on the NA mechanism of the BSO single crystal, open aperture Z-scan experiment with 4 ns laser pulse at 532 and 1064 nm wavelengths with different intensities was performed. Obtained data were analyzed with a theoretical model considering the contributions of one photon absorption (OPA), two photon absorption (TPA) and free carrier absorption (FCA) to NA. The results indicated that the NA behavior decreased with increasing of the pump intensity as the defect states at around 2.32 eV by OPA at 532 nm, and TPA at 1064 nm excitations. The dominant NA mechanisms are OPA and sequential TPA at 532 nm as compared to the 1064 nm. A higher NA coefficient was obtained at 532 nm as compared to 1064 nm excitation. This observation was attributed to higher contribution of OPA at 532 nm even at lower input intensities compared to TPA contribution at 1064 nm. Onset optical limiting thresholds were found as 0.34 and 0.68 mJ/cm2 for 532 and 1064 nm input beams, respectively. In the light of the results, the BSO single crystal may be used as a saturable absorber or an optical limiter at convenient input intensity by effectively adjusting defect states and excitation wavelength. •Bi12SiO20 single crystal was grown by Czochralski technique.•Bi12SiO20 single crystal possesses nonlinear absorption behavior at 532 nm and 1064 nm excitations.•The dominant NA mechanisms are OPA and sequential TPA at 532 nm as compared to the 1064 nm.•Onset optical limiting thresholds were found as 0.34 and 0.68 mJ/cm2 for 532 and 1064 nm input beams, respectively.