Nanoimprint lithography: Emergent materials and methods of actuation

[Display omitted] •Nanoimprint lithography (NIL) is a material processing tool with a rapidly expanding scope of applications.•Actuation of smart, shape changing materials via NIL imparts dynamic surface behaviors.•NIL-based processing of semi-crystalline polymers facilitates improved performance in solar cell, field effect transistor, and ferroelectric memory devices.•NIL of water filtration membranes reduces biofouling.•Nanoimprinting of porous inorganic materials is achieved both with and without modification of the underlying pore structure. Shortly after its inception, nanoimprint lithography (NIL) was primarily used as tool for the thermal embossing and flash curing of thermoplastic resists and polymer precursors, respectively. Driven by a need for high density material architectures, the semi-conductor industry served as the primary inspiration for NIL development for decades. However, as new resist materials have been explored, the variety of fields investing resources into the technology has grown, and NIL now finds applications actuating numerous organic and inorganic materials, imparting unique manifestations of elastic and plastic deformations. From photovoltaics to water filtration, the role of NIL is growing steadily, and this review illustrates the breadth of its impacts.