Comparison and analysis on static and dynamic performance of 1.2-kV SiC planar MOSFETs with different cell topologies

1.2-kV SiC MOSFETs with different cell topologies were fabricated based on the same design and process parameters in a commercial 6-inch SiC foundry. A series of comparative evaluations were conducted on the static and dynamic performance of SiC MOSFETs with common linear, island-shaped P+ linear, c...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials science in semiconductor processing 2024-12, Vol.184, p.108849, Article 108849
Hauptverfasser: Wu, Huan, Luo, Houcai, Zhang, Jingping, Zheng, Bofeng, Wang, Ruonan, Chen, Xianping
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:1.2-kV SiC MOSFETs with different cell topologies were fabricated based on the same design and process parameters in a commercial 6-inch SiC foundry. A series of comparative evaluations were conducted on the static and dynamic performance of SiC MOSFETs with common linear, island-shaped P+ linear, current sharing linear, and hexagonal cell topologies for the first time. The common linear cell topology has the lowest switching loss, but the highest on-resistance. The island-shaped P+ linear and current sharing linear cell topologies optimized the cell pitch, reduced the specific on-resistance by 9.68 %, but the freewheeling and surge capability of their body diode have been decreased. The current sharing linear cell topology has the highest Ciss/Crss, making it the lowest in crosstalk intensity. The hexagonal cell topology has the lowest on-resistance, but performs the worst in terms of blocking characteristics and switching losses.
ISSN:1369-8001
DOI:10.1016/j.mssp.2024.108849