Acid-free fabrication of polyaryletherketone membranes

Polyaryletherketones (PAEKs) are a class of ultrahigh performance polymers with outstanding temperature and chemical resistance. Poly(ether ketone ketone) copolymer (Kepstan®) and poly(ether ether ketone) (PEEK) display intrinsic insolubility in nearly all organic solvents. The primary issue for the application of these polymers is their processability which requires a high temperature/pressure-based technique, or the use of harsh and corrosive solvents, like methanesulfonic and sulfuric acid, resulting in sulfonation of the polymer backbone that adversely might affect their chemical stability. In this work, we propose a method to prepare porous Kepstan® and PEEK membranes using N-methyl-2-pyrrolidone (NMP) as solvent at room temperature. It consisted of a modification-regeneration strategy to turn commercial semi-crystalline Kepstan® and PEEK into dithiolane soluble derivatives that allow the fabrication of hollow fiber, flat-sheet, and electrospun nanofibers. The resulting membranes are then regenerated to the solvent-resistant materials. The novel Kepstan® and PEEK hollow fibers exhibited a N,N-dimethylformamide (DMF) permeance of 2.21 and 2.05 L m−2 h−2 bar−1, with more than 90% rejection of Crystal Violet (408 g mol−1) and Methyl Orange (327 g mol−1), respectively. [Display omitted] •Porous PEKK and PEEK hollow fiber membranes spun without strong acids at room temperature.•Solvent and temperature-resistant hollow fibers from commercial PEKK and PEEK.•Effective separation of molecules in the range of 327–408 g mol−1 in dimethylformamide.•Chemical modification-regeneration strategy to promote the polyketone processability.