Recent advances in Cd-based heterojunctions: From synthesis strategies to photocatalytic performance

Photocatalytic technology has drawn extensive recognition for its promising applications in environmental remediation. However, challenges such as low surface kinetic rates, inadequate surface area, poor thermal stability, limited light absorption, and serious recombination loss of photo-generated e...

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Veröffentlicht in:Journal of alloys and compounds 2025-01, Vol.1010, p.178309, Article 178309
Hauptverfasser: Ahmad, Irshad, Zhang, Yifei, AlFaify, Salem A., Li, Gao, Ashraf, Ibrahiem Mahmoud
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Sprache:eng
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Zusammenfassung:Photocatalytic technology has drawn extensive recognition for its promising applications in environmental remediation. However, challenges such as low surface kinetic rates, inadequate surface area, poor thermal stability, limited light absorption, and serious recombination loss of photo-generated electron-hole pairs continue to restrict the commercial viability of photocatalysis. Cd-based semiconductors, known for their distinct and efficient properties, are widely integrated with semiconductors with well-matched band structures to develop composite photocatalysts focused on addressing the above issues. This review discusses the most relevant synthetic processes and key strategies for modulating the properties of Cd-based materials. Initially, the fundamental properties of Cd-based oxides, chalcogenides, molybdates, tungstates, carbonates, and ferrites are reviewed. Subsequently, various important synthetic routes for controlling the morphologies and physiochemical properties of Cd-based materials are presented. Furthermore, viable design strategies for improving the photocatalytic performance of Cd-based materials are critically discussed. Then, mechanistic insights supporting these enhanced performances are also thoroughly considered. Finally, a viewpoint is provided on the current bottlenecks and future directions in the development of Cd-based materials for diverse photocatalytic applications.
ISSN:0925-8388
DOI:10.1016/j.jallcom.2024.178309