Poly(vinyl alcohol)-based photosensitive water-borne coating for low-temperature color-filter production

•A photosensitive overcoat was developed for low-temperature color filter production.•Photolithography of the material yielded the transparent microscale patterns.•The overcoat could be applied to uncured color filter patterns.•Green, red, and white patterns were printed at a process temperature of 85 °C. A photosensitive water-borne overcoat comprising poly(vinyl alcohol), a glycoluril crosslinker, and a water-soluble photoacid generator was developed. The passivation coating has two features: low-temperature processability and applicability to organic-solvent-susceptible films. Photo-exposure and subsequent baking at 85 °C and development with water produced PGMEA-insoluble and transparent overcoat patterns. Uncured color patterns that were susceptible to the PGMEA-based coating solution remained intact after water-based overcoat application. By exploiting the features of the passivation coating, color patterns of green, red, and white were produced onto a glass substrate at a process temperature of 85 °C.