Enhanced visible-light photocatalytic activity of g-C3N4/LaFeO3 heterojunctions for the removal of tetracycline hydrochloride
LaFeO3 nanoparticles were synthesized with hydrothermal method and g-C3N4 nanosheets were prepared from bulk g-C3N4 in alkaline solution, and then g-C3N4/LaFeO3 nanocomposites were successfully synthesized via electrostatic self-assembly method. All samples were characterized by XRD, TEM, TGA, BET a...
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Veröffentlicht in: | Diamond and related materials 2023-02, Vol.132, p.109685, Article 109685 |
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Sprache: | eng |
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Zusammenfassung: | LaFeO3 nanoparticles were synthesized with hydrothermal method and g-C3N4 nanosheets were prepared from bulk g-C3N4 in alkaline solution, and then g-C3N4/LaFeO3 nanocomposites were successfully synthesized via electrostatic self-assembly method. All samples were characterized by XRD, TEM, TGA, BET and UV–vis, which indicates that LaFeO3 nanoparticles are well-dispersed on g-C3N4 nanosheets to form g-C3N4/LaFeO3 nanocomposites. The photocatalytic activity of g-C3N4/LaFeO3 nanocomposites to tetracycline hydrochloride (TC-HCl) antibiotics under visible light irradiation is investigated and optimized in detail, indicating the excellent photocatalytic activity and chemical stability. The degradation efficiency of TC-HCl with 35%CNS/LF is 13.6-fold and 2.6-fold higher than those of pristine LaFeO3 nanoparticles and g-C3N4 nanosheets. The interface of g-C3N4/LaFeO3 p-n heterojunctions effectively separates the photogenerated electrons and holes, leading to the higher photocatalytic activity. Moreover, active species trapping experiments reveal that O2− is the dominant radical during photodegradation process.
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•LaFeO3 nanoparticles are anchored on g-C3N4 nanosheets to form CNS/LF nanocomposites.•CNS/LF nanocomposites present the excellent photocatalytic activity to TC-HCl.•The degradation efficiency of 35%CNS/LF is much higher than that of pristine samples.•CNS/LF heterojunctions effectively separates the photogenerated electron-hole pairs.•The radicals O2− is the dominant radical to TC-HCl in photocatalysis process. |
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ISSN: | 0925-9635 1879-0062 |
DOI: | 10.1016/j.diamond.2023.109685 |