Strain tunable electronic states of MoSe2 monolayer

[Display omitted] •MoSe2 monolayer can tolerate a large range of elastic strain.•Strain engineering is an effective approach to modulate the band structure of MoSe2 monolayer.•The strained MoSe2 monolayer still maintains the semiconductor property. First-principles calculations were carried out to s...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Chemical physics letters 2021-02, Vol.765, p.138286, Article 138286
Hauptverfasser: Tian, Yi, Sun, An, Ge, Zhizhong, Zhang, Yaoming, Huang, Songlei, Lv, Shuhui, Li, Hongping
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:[Display omitted] •MoSe2 monolayer can tolerate a large range of elastic strain.•Strain engineering is an effective approach to modulate the band structure of MoSe2 monolayer.•The strained MoSe2 monolayer still maintains the semiconductor property. First-principles calculations were carried out to study the influence of strain on the electronic structure of MoSe2 monolayer. Both uniaxial and biaxial strain were taken into consideration, and our calculations reveal that MoSe2 monolayer can tolerate a large range of elastic strain. More importantly, the electronic structure of MoSe2 monolayer can be significantly tuned by strain, which is attributed to the redistribution of Mo 4d and Se 4p orbitals. However, the strained MoSe2 monolayer still maintains the semiconductor properties, although its bandgap undergoes a transition from direct to indirect over a certain amount of strain.
ISSN:0009-2614
1873-4448
DOI:10.1016/j.cplett.2020.138286