Angstrom surface with high material removal rate for quartz glass induced by silk dissolved novel green chemical mechanical polishing

Angstrom surface with high material removal rate for quartz glass induced by silk dissolved novel green chemical mechanical polishing

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Veröffentlicht in:Colloids and surfaces. A, Physicochemical and engineering aspects Physicochemical and engineering aspects, 2024-02, Vol.682, p.132957, Article 132957
Hauptverfasser: Liu, Lu, Zhang, Zhenyu, Shi, Chunjing, Deng, Xingqiao, Zhou, Hongxiu, Feng, Junyuan, Liu, Xiuqing, Liu, Xiaoyu, Wen, Wei
Format: Artikel
Sprache:eng
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ISSN:0927-7757
DOI:10.1016/j.colsurfa.2023.132957