Near-surface analysis of magnetron sputtered AlCrNbYZrNx high entropy materials resolved by HAXPES

Hard X-ray photoelectron spectroscopy (HAXPES) was used to perform a non-destructive depth profile of AlCrNbYZrNx (x = 0 to ∼50 at.%) thin films. The outermost native oxide of the pristine thin films contained the highest coordination oxides of every metal. Substoichiometric oxides or oxynitrides were found underneath. After exposure to 1.0 M HCl, increases in the most highly coordinated oxides of Cr, Nb, and Al in films with up to 37 at.% N were observed, suggesting that the low coordination oxides and oxynitrides in the subsurface had been further oxidised and were intermediary compounds in the passivation process. Al and Y oxides were lost to the HCl electrolyte, in agreement with their respective Pourbaix diagrams. The film with 49 at.% N showed little to no change in the data due to its high porosity which led to the oxide being detected at all probed depths. The metal core level spectra revealed a preferential order in which nitrogen bonded with the different metals. Nitrogen interacted first with Y, then Zr, then Al and Nb, and lastly Cr as the nitrogen content was increased. [Display omitted] •Non-destructing depth profiling of AlCrNbYZrNx passive layers performed by HAXPES.•The outermost native oxide contains highest coordination oxide of every metal.•Sub-oxide contains substoichiometric oxides and oxynitrides.•Increased abundance of Cr, Nb and Al oxides after exposure to 1M HCl.•A preferential nitrogen-metal interaction followed formation enthalpies.