Modification of optical and mechanical surface properties of sputter-deposited aluminum thin films through ion implantation

Aluminum (Al) thin films are used widely as an electronic material in a variety of applications because of their high conductivity, optical reflectance and low cost. In the present study, helium (He) and nitrogen (N2) ions were implanted in sputter-deposited Al thin films with different doses and energies, and the changes in the film properties, such as the surface roughness, optical reflectance, hardness and Young’s modulus, were investigated. The results showed that the implantation of both ions smooth the surface of Al thin films by decreasing the hillock density, resulting in low global surface roughness. In particular, in the case of He ion implantation, the moderated degradation of optical reflectance was observed compared to the film implanted with nitrogen ion. On the other hand, excessive ion implantation increased the local (short-range) surface roughness, which deteriorated the optical reflectance of the Al films. The continuous stiffness measurement technique in nano-indentation showed that ion implantation increased the hardness near the surface. He ion implantation hardened the surface of the Al thin film, and almost 2 times higher surface hardness was achieved with an ion dose of 10 18 ions/cm 2 at 40 KeV.