A stitching algorithm for measuring large areas using scanning electron microscopes

SEM is very useful measuring equipment in the micro and nano area. In general, it is not used to accurately measure the size information of a sample, but to measure its shape characteristics. In addition, it has a measuring area that is limited to just several micro-meters, and it is unsuitable for accurate measurements larger than several tens of micro meters. This paper proposed a stitching algorithm for the split electron beam images using an image processing technique to minimize measurement error. Experiments were conducted targeting circular and rectangular shapes 500 nm∼10 μ in diameter and line length. Finally, stitching accuracy was verified through a comparison with AFM measuring data.