Surface Roughness and Structure of Electrodeposited Cu2O Layers on Si Substrates

Cu 2 O thin films were electrodeposited on n-Si (100) and p-Si (111) substrates, and characterized by X-ray diffraction, atomic force microscopy, transmission electron microscopy and optical reflectance measurements. The results showed Cu 2 O deposits with low surface roughness that increase continuously with the thickness. The grains are columnar with cone-shape and texture that follows the orientation of the substrate. The optical gap and the refraction index were also dependent on the texture of the layers.