Optoelectronic and photocatalytic properties of in situ platinum-doped TiO2 films deposited by means of pulsed laser ablation technique

We report on the effect of Pt incorporation on the microstructural, optoelectronic and catalytic properties of TiO 2 thin films deposited by means of the pulsed-laser deposition (PLD) method. The structural, morphological, optoelectronic and catalytic properties of the deposited TiO 2 :Pt films were...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of materials science. Materials in electronics 2017-02, Vol.28 (4), p.3317-3324
Hauptverfasser: Trabelsi, K., Hajjaji, A., Ka, I., Gaidi, M., Bessais, B., El Khakani, M. A.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:We report on the effect of Pt incorporation on the microstructural, optoelectronic and catalytic properties of TiO 2 thin films deposited by means of the pulsed-laser deposition (PLD) method. The structural, morphological, optoelectronic and catalytic properties of the deposited TiO 2 :Pt films were systematically investigated, as a function of their Pt content, by means of various techniques including X-ray diffraction, X-ray photoelectron spectroscopy (XPS), atomic force microscopy, Fourier-transform infra-red spectroscopy and ellipsometry. The in situ doping of the PLD-TiO 2 films, at different Pt contents, was achieved by the concomitant laser ablation of a TiO 2 target uniformly covered with Pt wires. We show that by increasing the number of Pt wires positioned on the TiO 2 target from 1 to 4, the Pt concentration of the TiO 2 :Pt films increases from 0.05 to 0.35 at.%. While the bandgap of room-temperature (RT) deposited films was found to be insensitive to their Pt content (remaining around the 3.2 eV anatase value), the TiO 2 :Pt films deposited at high temperature (T d  = 500 °C) were found to exhibit a significant narrowing of their bandgap (from 3.3 to 2.45 eV), when their Pt content is increased (from 3.3 to 2.45 eV). From a structural point of view, while the RT-deposited TiO 2 :Pt films deposited are mainly amorphous with the presence of some TiO 2 nanocrystallites whose density increases as Pt content increases, while those deposited at 500 °C were found to crystallize in the anatase phase with their crystallinity improving with increasing Pt contents. XPS analyses have revealed that the incorporated Pt mainly exists in a metallic state, likely as nano-inclusions in an otherwise TiO 2 matrix. By being able to monitor the optoelectronic properties of the annealed TiO 2 :Pt films through their Pt content, their photocatalytic activity was significantly improved with respect to that of their undoped TiO 2 counterpart. The enhancement of the photocatalytic activity is believed to be due to an enhanced photoabsorption of photons because of bandgap narrowing along with a better harvesting of the separated photogenerated charges.
ISSN:0957-4522
1573-482X
DOI:10.1007/s10854-016-5925-z