Nitrogen-doped TiO2 mesosponge layers formed by anodization of nitrogen-containing Ti alloys
An alloy containing 5 at.% of N was produced by arc melting of Ti and TiN powders. By anodization of the alloy in a 10 wt.% K 2 HPO 4 /glycerol electrolyte at 140 °C, oxide mesosponge layers can be formed with thickness as up to several micrometers. X-ray photoelectron spectroscopy confirms nitrogen...
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Veröffentlicht in: | Journal of solid state electrochemistry 2012, Vol.16 (1), p.89-92 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | An alloy containing 5 at.% of N was produced by arc melting of Ti and TiN powders. By anodization of the alloy in a 10 wt.% K
2
HPO
4
/glycerol electrolyte at 140 °C, oxide mesosponge layers can be formed with thickness as up to several micrometers. X-ray photoelectron spectroscopy confirms nitrogen uptake in the oxide. Photoelectrochemical measurements show successful N-doping of these mesoporous anodic layers with a significant visible light photoresponse. |
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ISSN: | 1432-8488 1433-0768 |
DOI: | 10.1007/s10008-010-1282-7 |