Nitrogen-doped TiO2 mesosponge layers formed by anodization of nitrogen-containing Ti alloys

An alloy containing 5 at.% of N was produced by arc melting of Ti and TiN powders. By anodization of the alloy in a 10 wt.% K 2 HPO 4 /glycerol electrolyte at 140 °C, oxide mesosponge layers can be formed with thickness as up to several micrometers. X-ray photoelectron spectroscopy confirms nitrogen...

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Veröffentlicht in:Journal of solid state electrochemistry 2012, Vol.16 (1), p.89-92
Hauptverfasser: Kim, Doohun, Tsuchiya, Hiroaki, Fujimoto, Shinji, Schmidt-Stein, Felix, Schmuki, Patrik
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Sprache:eng
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Zusammenfassung:An alloy containing 5 at.% of N was produced by arc melting of Ti and TiN powders. By anodization of the alloy in a 10 wt.% K 2 HPO 4 /glycerol electrolyte at 140 °C, oxide mesosponge layers can be formed with thickness as up to several micrometers. X-ray photoelectron spectroscopy confirms nitrogen uptake in the oxide. Photoelectrochemical measurements show successful N-doping of these mesoporous anodic layers with a significant visible light photoresponse.
ISSN:1432-8488
1433-0768
DOI:10.1007/s10008-010-1282-7