Ti-doped hematite thin films for efficient water splitting

Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indica...

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Veröffentlicht in:	Applied physics. A, Materials science & processing Materials science & processing, 2015-03, Vol.118 (4), p.1539-1542
Hauptverfasser:	Atabaev, Timur Sh, Ajmal, Muhammad, Hong, Nguyen Hoa, Kim, Hyung-Kook, Hwang, Yoon-Hwae
Format:	Artikel
Sprache:	eng
Schlagworte:	Characterization and Evaluation of Materials Condensed Matter Physics Machines Manufacturing Nanotechnology Optical and Electronic Materials Physics Physics and Astronomy Processes Surfaces and Interfaces Thin Films
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Zusammenfassung:	Uniform Ti-doped hematite thin films were deposited on transparent fluorine-doped tin oxide FTO coated glasses using a pulsed laser deposition method. An influence of dopant concentration on the photoelectrochemical characteristics was examined under water splitting. Photocurrent measurements indicated that 3 mol% of Ti atoms was optimal dopant concentration in hematite films produced by this method. The maximum photocurrent density of un-doped and 3 mol% Ti-doped Fe 2 O 3 photoelectrodes was 0.67 and 1.64 mA/cm 2 at 1.23 V versus RHE, respectively. The incorporation of Ti atoms into hematite photoelectrodes was found to drastically enhance the water splitting performance.
ISSN:	0947-8396 1432-0630
DOI:	10.1007/s00339-014-8937-7