A model of strain relaxation in hetero-epitaxial films on compliant substrates
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| Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 1998, Vol.66 (1), p.13-22 |
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| container_end_page | 22 |
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| container_issue | 1 |
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| container_title | Applied physics. A, Materials science & processing |
| container_volume | 66 |
| creator | KÄSTNER, G GÖSELE, U TAN, T. Y |
| description | |
| doi_str_mv | 10.1007/s003390050631 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 0947-8396 |
| ispartof | Applied physics. A, Materials science & processing, 1998, Vol.66 (1), p.13-22 |
| issn | 0947-8396 1432-0630 |
| language | eng |
| recordid | cdi_crossref_primary_10_1007_s003390050631 |
| source | SpringerLink Journals |
| subjects | Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Mechanical and acoustical properties Mechanical and acoustical properties adhesion Physical properties of thin films, nonelectronic Physics Solid surfaces and solid-solid interfaces Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) |
| title | A model of strain relaxation in hetero-epitaxial films on compliant substrates |
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