Characterization of Long Phase Masks for Writing Fiber Bragg Gratings
We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift.
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| Veröffentlicht in: | Optical fiber technology 1996-07, Vol.2 (3), p.281-284 |
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| container_end_page | 284 |
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| container_issue | 3 |
| container_start_page | 281 |
| container_title | Optical fiber technology |
| container_volume | 2 |
| creator | Ouellette, François Krug, Peter A. Pasman, Remco |
| description | We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift. |
| doi_str_mv | 10.1006/ofte.1996.0034 |
| format | Article |
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| fulltext | fulltext |
| identifier | ISSN: 1068-5200 |
| ispartof | Optical fiber technology, 1996-07, Vol.2 (3), p.281-284 |
| issn | 1068-5200 1095-9912 |
| language | eng |
| recordid | cdi_crossref_primary_10_1006_ofte_1996_0034 |
| source | Elsevier ScienceDirect Journals Complete |
| title | Characterization of Long Phase Masks for Writing Fiber Bragg Gratings |
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