Characterization of Long Phase Masks for Writing Fiber Bragg Gratings

Characterization of Long Phase Masks for Writing Fiber Bragg Gratings

We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift.

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Veröffentlicht in:Optical fiber technology 1996-07, Vol.2 (3), p.281-284
Hauptverfasser: Ouellette, François, Krug, Peter A., Pasman, Remco
Format: Artikel
Sprache:eng
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Zusammenfassung:We analyze the effects of periodic phase shifts due to stitching errors in phase masks made by electron beam lithography. Fiber gratings written with these masks show sidebands, the strength of which is used to determine the value of the phase shift.
ISSN:1068-5200
1095-9912
DOI:10.1006/ofte.1996.0034