Integration of (Poly‐Si/Air)n Distributed Bragg Reflectors in a 150 mm Bulk Micromachined Wafer‐Level MOEMS Fabrication Process
This paper reports the development and integration of (Poly‐Si/Air)n Distributed BRAGG Reflectors (DBR) in a MOEMS Fabry‐Pérot‐Interferometer (FPI) concept. The realized reflectors constitute a promising and resource‐efficient alternative to complex Ion‐Assisted Deposition based DBRs while maintaini...
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Veröffentlicht in: | IEEJ transactions on electrical and electronic engineering 2024-05, Vol.19 (5), p.767-772 |
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Hauptverfasser: | , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | This paper reports the development and integration of (Poly‐Si/Air)n Distributed BRAGG Reflectors (DBR) in a MOEMS Fabry‐Pérot‐Interferometer (FPI) concept. The realized reflectors constitute a promising and resource‐efficient alternative to complex Ion‐Assisted Deposition based DBRs while maintaining their advantages. Compared to state of the art MOEMS FPIs the (Poly‐Si/Air)n DBRs can be integrated into two moveable reflector carriers based on two individually fabricated wafers which are bonded. The (Poly‐Si/Air)n DBRs are investigated as (HL) and (HL)2 reflector stacks showing a reflectance above 91% within the wavelength range of 2.8–5.7 μm. © 2023 The Authors. IEEJ Transactions on Electrical and Electronic Engineering published by Institute of Electrical Engineer of Japan and Wiley Periodicals LLC. |
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ISSN: | 1931-4973 1931-4981 |
DOI: | 10.1002/tee.23960 |