Patterned Perovskites for Optoelectronic Applications

As a mature strategy for constructing microstructures, patterning technologies are widely used in the optoelectronic field to satisfy the requirements of functional and/or aesthetic purposes. With the emergence of organic–inorganic hybrid perovskites, applying patterning technologies to perovskites can further optimize the properties of perovskite‐based optoelectronic devices, thereby enhancing their competitiveness in commercialization. To date, a series of perovskite patterning methods and patterned devices have been reported consecutively, which exhibit potential value and application prospects in the fields of optoelectronics, light‐emitting devices, building of integrated photovoltaic systems, etc. Here, the recent progress in perovskite patterning technologies is systematically summarized, divided into two major categories: indirect patterning and direct patterning. In addition, the merits of the patterning methods and their applications in optoelectronics are discussed. Patterning technologies for organic–inorganic hybrid perovskites (OIHPs), including indirect patterning and direct patterning, for optoelectronic applications, are summarized. Various patterning technologies achieve novel patterns and microstructures of OIHPs, optimizing light absorption, charge‐carrier transportation, and moisture resistance in OIHP‐based optodevices. Therefore, patterning technologies exhibit potential value and application prospects in the field of OIHP‐based optoelectronics.