No‐Heating Deposition of 1‐μm‐Thick Y‐Doped HfO 2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method

No‐Heating Deposition of 1‐μm‐Thick Y‐Doped HfO 2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method

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Veröffentlicht in:Physica status solidi. PSS-RRL. Rapid research letters 2022-10, Vol.16 (10)
Hauptverfasser: Shimura, Reijiro, Mimura, Takanori, Tateyama, Akinori, Shiraishi, Takahisa, Shimizu, Takao, Yamada, Tomoaki, Tanaka, Yoshitomo, Inoue, Yukari, Funakubo, Hiroshi
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container_title Physica status solidi. PSS-RRL. Rapid research letters
container_volume 16
creator Shimura, Reijiro
Mimura, Takanori
Tateyama, Akinori
Shiraishi, Takahisa
Shimizu, Takao
Yamada, Tomoaki
Tanaka, Yoshitomo
Inoue, Yukari
Funakubo, Hiroshi
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doi_str_mv 10.1002/pssr.202100574
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title No‐Heating Deposition of 1‐μm‐Thick Y‐Doped HfO 2 Ferroelectric Films with Good Ferroelectric and Piezoelectric Properties by Radio Frequency Magnetron Sputtering Method
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