Light Emission from Silicon Nanostructures Produced by Conventional Lithographic and Reactive Ion Etching Techniques

Sub‐ten nanometer diameter silicon pillars and silicon walls of the same thickness are fabricated by using conventional optical lithography based on deep‐UV exposure and reactive ion etching using fluorine only containing gases. The produced structures are studied for their luminescence properties....

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Veröffentlicht in:	Physica status solidi. B. Basic research 1995-07, Vol.190 (1), p.91-95
Hauptverfasser:	Nassiopoulos, A. G., Grigoropoulos, S., Papadimitriou, D., Gocolides, E.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation Other solid inorganic materials Photoluminescence Physics Surface treatments
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