Nanostructures by diffraction mask projection laser ablation

The top‐down method diffraction mask projection laser ablation (DiMPLA) to produce large‐area substrate‐bound metal nanostructure matrices is discussed in detail. It involves phase mask projection and patterning of an ultra‐thin metal film. Investigations concerning the patterning process and parameter frontiers are presented along with results of different materials patterned with DiMPLA. The material combination of thin film and substrate used most is investigated precisely allowing conclusions about the structure formation process as well as possible applications. Presented possible applications include three different PVD techniques for templated nanostructure growth as well as first steps toward plasmonic applications of gold nanodot matrices. Top view of a gold nanodot matrix on a sapphire substrate.