A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces

Diamond Thin‐Film Growth In article 2200351, Philip Schätzle and colleagues present a chemical vapor deposition diamond reactor with sample transfer equipment. This enables a rapid removal of the sample from plasma, interrupting the growth process immediately. Growth resumption can then be performed...

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Veröffentlicht in:	Physica status solidi. A, Applications and materials science Applications and materials science, 2023-02, Vol.220 (4), p.n/a
Hauptverfasser:	Schätzle, Philip, Reinke, Philipp, Herrling, David, Götze, Arne, Lindner, Lukas, Jeske, Jan, Kirste, Lutz, Knittel, Peter
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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