A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces

A Chemical Vapor Deposition Diamond Reactor for Controlled Thin‐Film Growth with Sharp Layer Interfaces

Diamond Thin‐Film Growth In article 2200351, Philip Schätzle and colleagues present a chemical vapor deposition diamond reactor with sample transfer equipment. This enables a rapid removal of the sample from plasma, interrupting the growth process immediately. Growth resumption can then be performed...

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Veröffentlicht in:Physica status solidi. A, Applications and materials science Applications and materials science, 2023-02, Vol.220 (4), p.n/a
Hauptverfasser: Schätzle, Philip, Reinke, Philipp, Herrling, David, Götze, Arne, Lindner, Lukas, Jeske, Jan, Kirste, Lutz, Knittel, Peter
Format: Artikel
Sprache:eng
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Zusammenfassung:Diamond Thin‐Film Growth In article 2200351, Philip Schätzle and colleagues present a chemical vapor deposition diamond reactor with sample transfer equipment. This enables a rapid removal of the sample from plasma, interrupting the growth process immediately. Growth resumption can then be performed when re‐introducing the sample into changed plasma compositions. This allows for sharp doping profiles in diamond thin films as required by diamond quantum technologies.
ISSN:1862-6300
1862-6319
DOI:10.1002/pssa.202370007