Coloring and Bleaching Properties of 500–1000 nm‐Thick Electrochromic Tungsten Oxide Films Deposited by Reactive Direct Current Magnetron Sputtering

Amorphous tungsten oxide films are prepared on indium tin oxide/glass substrates using reactive magnetron sputtering and their electrochromic (EC) properties are investigated. To achieve the densely colored films, samples of 500 and 1000 nm thickness are deposited with different pumping speeds and oxygen flow rates at Ar 3 Pa atmosphere. The as‐deposited films are similarly transparent (≈80%), but their EC properties vary depending on the deposition conditions and strongly on film thickness. The 500 nm‐thick samples have a transmittance of 4–8% in the colored state, which recover well in the bleached state. In contrast, the 1000 nm‐thick films have very low transmittance (