Back Cover: Plasma Process. Polym. 9∕2014

Back Cover: Plasma Process. Polym. 9∕2014

Back Cover: The combination of cold plasma with thermal treatment enables doping and changed growth of semiconductors that cannot be achieved by either treatment alone. The combination applied to commercial SnO powder produced SnO2 with a nano‐scale polycrystalline structure and controllable nitroge...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Plasma processes and polymers 2014-09, Vol.11 (9), p.904-904
Hauptverfasser: Rubín de Celis, David, Chen, Zhiqiang, Rahman, Md Mohklesur, Tao, Tao, McCulloch, Dougal G., Field, Matthew R., Lamb, Peter R., Chen, Ying, Dai, Xiujuan J.
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Back Cover: The combination of cold plasma with thermal treatment enables doping and changed growth of semiconductors that cannot be achieved by either treatment alone. The combination applied to commercial SnO powder produced SnO2 with a nano‐scale polycrystalline structure and controllable nitrogen doping of up to 5 at. %. This product has potential as an improved anode material for Li‐ion batteries. Further details can be found in the article Xiujuan J. Dai et al. on page 897.
ISSN:1612-8850
1612-8869
DOI:10.1002/ppap.201470037