Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy
Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectr...
Gespeichert in:
| Veröffentlicht in: | Journal of polymer science. Part A, Polymer chemistry Polymer chemistry, 1994-09, Vol.32 (12), p.2275-2281 |
|---|---|
| Hauptverfasser: | , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 2281 |
|---|---|
| container_issue | 12 |
| container_start_page | 2275 |
| container_title | Journal of polymer science. Part A, Polymer chemistry |
| container_volume | 32 |
| creator | Kuruvilla, Beena Annie Zambre, Madhukar Gosavi, Suresh Gorwadkar, Sucheta Datta, A. Gangal, S. A. Kulkarni, S. K. |
| description | Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc. |
| doi_str_mv | 10.1002/pola.1994.080321209 |
| format | Article |
| fullrecord | <record><control><sourceid>wiley_cross</sourceid><recordid>TN_cdi_crossref_primary_10_1002_pola_1994_080321209</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>POLA080321209</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3699-533de8decbc60a55c3116b06b95d71842de61ba0baa5e95aca6949e244e2d123</originalsourceid><addsrcrecordid>eNqNkNFLwzAQxoMoOKd_gS958LUzaZq2eRGq6BQ6N2Xo3sI1TWc1bUozcf3v7awMH4WDO7j7ft_xIXROyYQS4l821sCEChFMSEyYT30iDtCIEiE8wml8iEYkjiMv9IPVMTpx7p2QfsfjEXpKajCdKx22BV4sZrMEF6WpHC5aW2G77da6xo0BVwH-dGW9xiuvhQ43b3ZjtdFq09oau-ZncMo23Sk6KsA4ffbbx2h5d7u8uffS-fThJkk9xcL-L85YruNcq0yFBDhXjNIwI2EmeB7ROPBzHdIMSAbAteCgIBSB0H4QaD-nPhsjNmBV7-taXcimLStoO0mJ3IUid6HIXShyH0qvuhhUDTgFpmihVqXbS4PemPU1RlfD2VdpdPcfslzM0-SvjzcASrfR2z0A2g8ZRizi8vVxKmfP12lKX4Rcsm9x_IVV</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Kuruvilla, Beena Annie ; Zambre, Madhukar ; Gosavi, Suresh ; Gorwadkar, Sucheta ; Datta, A. ; Gangal, S. A. ; Kulkarni, S. K.</creator><creatorcontrib>Kuruvilla, Beena Annie ; Zambre, Madhukar ; Gosavi, Suresh ; Gorwadkar, Sucheta ; Datta, A. ; Gangal, S. A. ; Kulkarni, S. K.</creatorcontrib><description>Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc.</description><identifier>ISSN: 0887-624X</identifier><identifier>EISSN: 1099-0518</identifier><identifier>DOI: 10.1002/pola.1994.080321209</identifier><identifier>CODEN: JPLCAT</identifier><language>eng</language><publisher>New York: John Wiley & Sons, Inc</publisher><subject>Applied sciences ; electron beam resist ; Exact sciences and technology ; Physicochemistry of polymers ; plasma polymerization ; Polymerization ; Polymers and radiations ; X-ray photoelectron spectroscopy</subject><ispartof>Journal of polymer science. Part A, Polymer chemistry, 1994-09, Vol.32 (12), p.2275-2281</ispartof><rights>Copyright © 1994 John Wiley & Sons, Inc.</rights><rights>1994 INIST-CNRS</rights><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3699-533de8decbc60a55c3116b06b95d71842de61ba0baa5e95aca6949e244e2d123</citedby><cites>FETCH-LOGICAL-c3699-533de8decbc60a55c3116b06b95d71842de61ba0baa5e95aca6949e244e2d123</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fpola.1994.080321209$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fpola.1994.080321209$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27903,27904,45553,45554</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=4184384$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kuruvilla, Beena Annie</creatorcontrib><creatorcontrib>Zambre, Madhukar</creatorcontrib><creatorcontrib>Gosavi, Suresh</creatorcontrib><creatorcontrib>Gorwadkar, Sucheta</creatorcontrib><creatorcontrib>Datta, A.</creatorcontrib><creatorcontrib>Gangal, S. A.</creatorcontrib><creatorcontrib>Kulkarni, S. K.</creatorcontrib><title>Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy</title><title>Journal of polymer science. Part A, Polymer chemistry</title><addtitle>J. Polym. Sci. A Polym. Chem</addtitle><description>Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc.</description><subject>Applied sciences</subject><subject>electron beam resist</subject><subject>Exact sciences and technology</subject><subject>Physicochemistry of polymers</subject><subject>plasma polymerization</subject><subject>Polymerization</subject><subject>Polymers and radiations</subject><subject>X-ray photoelectron spectroscopy</subject><issn>0887-624X</issn><issn>1099-0518</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1994</creationdate><recordtype>article</recordtype><recordid>eNqNkNFLwzAQxoMoOKd_gS958LUzaZq2eRGq6BQ6N2Xo3sI1TWc1bUozcf3v7awMH4WDO7j7ft_xIXROyYQS4l821sCEChFMSEyYT30iDtCIEiE8wml8iEYkjiMv9IPVMTpx7p2QfsfjEXpKajCdKx22BV4sZrMEF6WpHC5aW2G77da6xo0BVwH-dGW9xiuvhQ43b3ZjtdFq09oau-ZncMo23Sk6KsA4ffbbx2h5d7u8uffS-fThJkk9xcL-L85YruNcq0yFBDhXjNIwI2EmeB7ROPBzHdIMSAbAteCgIBSB0H4QaD-nPhsjNmBV7-taXcimLStoO0mJ3IUid6HIXShyH0qvuhhUDTgFpmihVqXbS4PemPU1RlfD2VdpdPcfslzM0-SvjzcASrfR2z0A2g8ZRizi8vVxKmfP12lKX4Rcsm9x_IVV</recordid><startdate>199409</startdate><enddate>199409</enddate><creator>Kuruvilla, Beena Annie</creator><creator>Zambre, Madhukar</creator><creator>Gosavi, Suresh</creator><creator>Gorwadkar, Sucheta</creator><creator>Datta, A.</creator><creator>Gangal, S. A.</creator><creator>Kulkarni, S. K.</creator><general>John Wiley & Sons, Inc</general><general>Wiley</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>199409</creationdate><title>Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy</title><author>Kuruvilla, Beena Annie ; Zambre, Madhukar ; Gosavi, Suresh ; Gorwadkar, Sucheta ; Datta, A. ; Gangal, S. A. ; Kulkarni, S. K.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3699-533de8decbc60a55c3116b06b95d71842de61ba0baa5e95aca6949e244e2d123</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1994</creationdate><topic>Applied sciences</topic><topic>electron beam resist</topic><topic>Exact sciences and technology</topic><topic>Physicochemistry of polymers</topic><topic>plasma polymerization</topic><topic>Polymerization</topic><topic>Polymers and radiations</topic><topic>X-ray photoelectron spectroscopy</topic><toplevel>online_resources</toplevel><creatorcontrib>Kuruvilla, Beena Annie</creatorcontrib><creatorcontrib>Zambre, Madhukar</creatorcontrib><creatorcontrib>Gosavi, Suresh</creatorcontrib><creatorcontrib>Gorwadkar, Sucheta</creatorcontrib><creatorcontrib>Datta, A.</creatorcontrib><creatorcontrib>Gangal, S. A.</creatorcontrib><creatorcontrib>Kulkarni, S. K.</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><jtitle>Journal of polymer science. Part A, Polymer chemistry</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kuruvilla, Beena Annie</au><au>Zambre, Madhukar</au><au>Gosavi, Suresh</au><au>Gorwadkar, Sucheta</au><au>Datta, A.</au><au>Gangal, S. A.</au><au>Kulkarni, S. K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy</atitle><jtitle>Journal of polymer science. Part A, Polymer chemistry</jtitle><addtitle>J. Polym. Sci. A Polym. Chem</addtitle><date>1994-09</date><risdate>1994</risdate><volume>32</volume><issue>12</issue><spage>2275</spage><epage>2281</epage><pages>2275-2281</pages><issn>0887-624X</issn><eissn>1099-0518</eissn><coden>JPLCAT</coden><abstract>Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc.</abstract><cop>New York</cop><pub>John Wiley & Sons, Inc</pub><doi>10.1002/pola.1994.080321209</doi><tpages>7</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0887-624X |
| ispartof | Journal of polymer science. Part A, Polymer chemistry, 1994-09, Vol.32 (12), p.2275-2281 |
| issn | 0887-624X 1099-0518 |
| language | eng |
| recordid | cdi_crossref_primary_10_1002_pola_1994_080321209 |
| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Applied sciences electron beam resist Exact sciences and technology Physicochemistry of polymers plasma polymerization Polymerization Polymers and radiations X-ray photoelectron spectroscopy |
| title | Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-21T15%3A09%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-wiley_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Analysis%20of%20PPMMA%20films%20from%20oxygen%20plasma%20using%20X-ray%20photoelectron%20spectroscopy&rft.jtitle=Journal%20of%20polymer%20science.%20Part%20A,%20Polymer%20chemistry&rft.au=Kuruvilla,%20Beena%20Annie&rft.date=1994-09&rft.volume=32&rft.issue=12&rft.spage=2275&rft.epage=2281&rft.pages=2275-2281&rft.issn=0887-624X&rft.eissn=1099-0518&rft.coden=JPLCAT&rft_id=info:doi/10.1002/pola.1994.080321209&rft_dat=%3Cwiley_cross%3EPOLA080321209%3C/wiley_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |