Analysis of PPMMA films from oxygen plasma using X-ray photoelectron spectroscopy

Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectr...

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Veröffentlicht in:	Journal of polymer science. Part A, Polymer chemistry Polymer chemistry, 1994-09, Vol.32 (12), p.2275-2281
Hauptverfasser:	Kuruvilla, Beena Annie, Zambre, Madhukar, Gosavi, Suresh, Gorwadkar, Sucheta, Datta, A., Gangal, S. A., Kulkarni, S. K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences electron beam resist Exact sciences and technology Physicochemistry of polymers plasma polymerization Polymerization Polymers and radiations X-ray photoelectron spectroscopy
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Beschreibung
Zusammenfassung:	Plasma polymerized methyl methacrylate (PPMMA) films have been synthesised on silicon substrates in RF glow discharge using oxygen plasma. The electron beam delineation sensitivity of the PPMMA films has been studied systematically by varying oxygen and monomer flow rates. X‐ray photoelectron spectroscopy (XPS) analysis clearly illustrates how C/O ratio in the films determines the properties of PPMMA films as electron beam resist. © 1994 John Wiley & Sons, Inc.
ISSN:	0887-624X 1099-0518
DOI:	10.1002/pola.1994.080321209