Polysilanes: Photochemistry and deep UV lithography

Polysilanes: Photochemistry and deep UV lithography

The photochemistry of poly(cyclohexylmethylsilane) (PCHMS) has been studied, and PCHMS homopolymer has been shown to be useful for high resolution, deep UV pattern generation either by using a commercial 1:1 projection printer operating in the deep UV or by an excimer laser stepper at 248 nm. In the...

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Veröffentlicht in:Polymer engineering and science 1989-07, Vol.29 (13), p.882-886
Hauptverfasser: Miller, R. D., Wallraff, G., Clecak, N., Sooriyakumaran, R., Michl, J., Karatsu, T., McKinley, A. J., Klingensmith, K. A., Downing, J.
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Applied sciences
Exact sciences and technology
Polymer industry, paints, wood
Technology of polymers
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container_end_page 886
container_issue 13
container_start_page 882
container_title Polymer engineering and science
container_volume 29
creator Miller, R. D.
Wallraff, G.
Clecak, N.
Sooriyakumaran, R.
Michl, J.
Karatsu, T.
McKinley, A. J.
Klingensmith, K. A.
Downing, J.
description The photochemistry of poly(cyclohexylmethylsilane) (PCHMS) has been studied, and PCHMS homopolymer has been shown to be useful for high resolution, deep UV pattern generation either by using a commercial 1:1 projection printer operating in the deep UV or by an excimer laser stepper at 248 nm. In the case of the excimer laser stepper, images 0.5 μm and smaller have been printed, which represents an improvement over the 0.8 μm limit previously reported for polysilane copolymers.
doi_str_mv 10.1002/pen.760291311
format Article
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subjects Application fields
Applied sciences
Exact sciences and technology
Polymer industry, paints, wood
Technology of polymers
title Polysilanes: Photochemistry and deep UV lithography
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